Development of CVD Ti-containing films
2013-12-02
org.kosen.entty.User@35502623
이상호(RGB3)
행사&학회소개
1. Introduction
2. CVD Ti-containing films
2.1. Titanium films
2.2. Binary Ti-containing films
2.3. Ternary Ti-containing films
2.4. Quaternary Ti-containing films
3. Deposition techniques based on CVD applied to Ti-containing films deposition
3.1. Plasma chemical vapor deposition (PCVD)
3.2. Chemical vapor deposition in a fluidized bed reactor (FBR-CVD)
3.3. Laser chemical vapor deposition (LCVD)
3.4. Photo-induced chemical vapor deposition (Photo-induced CVD or Photo-CVD)
3.5. Other novel techniques based on CVD method for Ti-containing films
4. Titanium precursors
4.1. Titanium chlorides
4.2. Ti-containing organic complexes
4.3. Anhydrous nitrate precursors
5. Conclusions and outlook
Acknowledgments
References
2. CVD Ti-containing films
2.1. Titanium films
2.2. Binary Ti-containing films
2.3. Ternary Ti-containing films
2.4. Quaternary Ti-containing films
3. Deposition techniques based on CVD applied to Ti-containing films deposition
3.1. Plasma chemical vapor deposition (PCVD)
3.2. Chemical vapor deposition in a fluidized bed reactor (FBR-CVD)
3.3. Laser chemical vapor deposition (LCVD)
3.4. Photo-induced chemical vapor deposition (Photo-induced CVD or Photo-CVD)
3.5. Other novel techniques based on CVD method for Ti-containing films
4. Titanium precursors
4.1. Titanium chlorides
4.2. Ti-containing organic complexes
4.3. Anhydrous nitrate precursors
5. Conclusions and outlook
Acknowledgments
References
보고서작성신청
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