KOSEN 한인과학기술자네트워크

아직 국내정보제공기관에서는 소장하고 있지 않은 것 같습니다. 다만, 서울대학교의 Dielectric Thin Film Lab.에서 국내 연구자들이 ISIF 2000 에서 발표한 논문들을 발간한 것으로 보아 그곳에 문의해보시는 것이 좋을 듯 합니다. 아래의 서지사항은 그곳에 나와있는 국내연구자들의 논문입니다. 9.C.S.Hwang, J.Song, S.Y.Kang, J.Park, H.R.Kim, Y.J.Cho, O.S.Kwon, J.C.Shin, K.H.Choi, S.Y.No, H.J.Kim and D.Y.Yang, C.H.Yang, Y.K.Han, C.J.Hwang, "The high dielectric and ferroelectric capacitor technologies using all CVD processes", 12th International Symposium on Integrated Ferroelectrics, March 14 2000, Aachen, Germany (2000) 10. J.Park, C.S.Hwang and D.Y.Yang, C.H.Yang, D.H.Kim, Y.K.Han, C.J.Hwang, "Electrical structure of (Ba,Sr)TiO3 thin films deposited by low temperature MOCVD", 12th International Symposium on Integrated Ferroelectrics, March 14 2000, Aachen, Germany (2000) 11. O.S.Kwon, H.R.Kim, C.S.Hwang and D.Y.Yang, Y.K.Han, "Low temperature(<500℃) deposition and characterization of Pb(Zr,Ti)O3 thin films by a new type metal-organic chemical vapor deposition", poster, 12th International Symposium on Integrated Ferroelectrics, March 13 2000, Aachen, Germany (2000) 12. J.Song, S.Jeong, J.Park and C.S.Hwang, "Oxidation behavior of TiAlN diffusion barrier layer beneath Pt, Ir and Ru", poster, 12th International Symposium on Integrated Ferroelectrics, March 14 2000, Aachen, Germany (2000) 13. H.J.Woo, D.Y.Park, D.S.Lee, S.H.Kim, J.Ha, C.S.Hwang and E.Yoon, "Study on simple stacked electrode structure for high density ferroelectric memory devices", poster, 12th International Symposium on Integrated Ferroelectrics, March 12-15 2000, Aachen, Germany (2000) >ISIF 2000 proceeding 가지고 계신분 부탁합니다