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지식나눔

지식나눔

문제 풀이 부탁 드립니다..제발

2005-12-14 org.kosen.entty.User@38c86b6b 김규완(kimkyuwan)
  • 1
1.Describe the deposition mechanism which occurs in general CVD process 2.Describe how temperature affects the deposition rate. 3.Describe the differences between ALD and CVD processes in detail 4.Describe how the sol-gel process can be used to make thin films as well as nano-sized powders. 5.List various non-volatile memory devices. What are the main cahracteristics for each type of memory device?
  • ALD
  • CVD
  • MEMORY DEVICE
지식의 출발은 질문, 모든 지식의 완성은 답변! 
각 분야 한인연구자와 현업 전문가분들의 답변을 기다립니다.
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    김영주님의 답변

    2005-12-14
    • 0
    >1.Describe the deposition mechanism which occurs in general CVD process >2.Describe how temperature affects the deposition rate. >3.Describe the differences between ALD and CVD processes in detail >4.Describe how the sol-gel process can be used to make thin films as well as nano-sized powders. >5.List various non-volatile memory devices. What are the main cahracteristics for each type of memory device? 이런 숙제를 여기에 올리는것은 잘못됐다고 봅니다... ^^
    답변수정
    >1.Describe the deposition mechanism which occurs in general CVD process >2.Describe how temperature affects the deposition rate. >3.Describe the differences between ALD and CVD processes in detail >4.Describe how the sol-gel process can be used to make thin films as well as nano-sized powders. >5.List various non-volatile memory devices. What are the main cahracteristics for each type of memory device? 이런 숙제를 여기에 올리는것은 잘못됐다고 봅니다... ^^
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