Various materials are increasingly being used as thin film forms in electronic, optical, optoelectronic, and acoustoelectronic devices. Since 1986, TFRL has conducted fundamental and applied researches pertinent to thin film materials that are needed for a wide variety of application areas, including high-power and high-temperature electronic devices, high-density memories, ferroelectric memories, ULSI devices, and telecommunication components.
TFRL carries out various research projects with industry and/or government laboratories in providing the leadership for thin film technology issues through preparation/characterization of thin film materials and fabrication/evaluation of their application devices.
Descriptions of our research activities are classified into Silicon Carbide, Ferro/Dielectric Materials, Telecommunication Devices, and Electronic Devices. Detailed descriptions are given in each research section.
